Using Contrast Curve in Electron Beam Lithography (EBL) Process Development

UI Holonyak Micro & Nanotechnology Lab
UI Holonyak Micro & Nanotechnology Lab
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Published 2020-04-27
Dr. Edmond Chow explains how to measure and use contrast curve in electron beam lithography (EBL) process. He shares practical tips and applications on using contrast curve in EBL process and show how to improve your EBL effectiveness and success including migration to a new, higher energy, EBL system.
All Comments (3)
  • @oscarcamacho5878
    The constrast curve fitting function. From which source you obtained it from? The ones I found in other bibliographies looks different.
  • @hussoe4321
    Great, thanks a lot. So, in your pattern geometry for the contrast curve measurements on slide#4, when you write one rectangle the neighboring rectangles would be affected due to the backscattering of electrons. What can you comment on this issue?